摘要： 利用等离子体化学气相沉积的方式制备的SiN膜，总的气流量、压强、微波功率、硅烷、氨气气流量的配比，直接影响SiN膜的膜厚、折射率。本文主要针对不同厚度的SiN膜进行分析，跟踪多晶电池的转换效率，来确定最佳的SiN膜的厚度和折射率。
Abstract: When making SiN film by using the plasma chemical vapour deposition (PCVD), proportions of total airflow, pressure, microwave power, silane, ammonia airflow directly impact of the thickness and refractive index. The article observes the conversion efficiency of polycrystalline battery with different thickness, and determines the best thickness and refractive index of SiN film.
关键词： SiN膜；膜厚；折射率
Key words: SiN film；film thickness；reflectivity
中图分类号：O649.1 文献标识码：A 文章编号：1006-4311（2012）03-0025-01